Temperature and fluid control / Slurry supplying apparatus
Continuous slurry dispenser P85
Overview
We have diluted the stock solution and supplied the temperature controlled slurry to the polishing machine continuously and realized space saving, energy saving and low cost by our proprietary transfer, dilution and temperature control system.
Applications
Back grinder, CMP, polish grinder, grinding equipment
Specifications
| slurry | Colloidal silica-based pH11 |
|---|---|
| Dilution factor | 10, 15, 20 times |
| pH control | pH10~11±0.2 |
| Temperature control | 20～40±0.5℃ |
| The supply flow rate | 1.5L/min ､0.3MPa |
| Slurry tank | 20L built-in |
|---|---|
| Ammonia tank | 5L built |
| External dimensions | W1250*D580*H1400 |
| weight | 500kg |
Related products
Slurry Supplying Apparatus Product Lineup
Contact
Contact
Please feel free to contact us with any questions about equipment development and manufacturing, or requests for custom solutions.
042-659-3915
Weekdays 9:00–17:00 (Closed on weekends and holidays)
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